Effect of post-annealing on structural and electrochromic properties of Mo-doped V2O5 thin films

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Structural, Electrical and Optical Properties of Molybdenum Oxide Thin Films Prepared by Post-annealing of Mo Thin Films

Molybdenum thin films with 50 and 150 nm thicknesses were deposited on silicon substrates, using DC magnetron sputtering system, then post-annealed at different temperatures (200, 325, 450, 575 and 700°C) with flow oxygen at 200 sccm (standard Cubic centimeter per minute). The crystallographic structure of the films was obtained by means of x-ray diffraction (XRD) analysis. An atomic force micr...

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Structural, Electrical and Optical Properties of Molybdenum Oxide Thin Films Prepared by Post-annealing of Mo Thin Films

Molybdenum thin films with 50 and 150 nm thicknesses were deposited on silicon substrates, using DC magnetron sputtering system, then post-annealed at different temperatures (200, 325, 450, 575 and 700°C) with flow oxygen at 200 sccm (standard Cubic centimeter per minute). The crystallographic structure of the films was obtained by means of x-ray diffraction (XRD) analysis. An atomic force micr...

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structural, electrical and optical properties of molybdenum oxide thin films prepared by post-annealing of mo thin films

molybdenum thin films with 50 and 150 nm thicknesses were deposited on silicon substrates, using dc magnetron sputtering system, then post-annealed at different temperatures (200, 325, 450, 575 and 700°c) with flow oxygen at 200 sccm (standard cubic centimeter per minute). the crystallographic structure of the films was obtained by means of x-ray diffraction (xrd) analysis. an atomic force micr...

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ژورنال

عنوان ژورنال: Journal of Sol-Gel Science and Technology

سال: 2015

ISSN: 0928-0707,1573-4846

DOI: 10.1007/s10971-015-3889-8